• 1981. 3. - 1985. 2. : B.S., Chemistry, Sungkyunkwan University
• 1985. 3. - 1987. 2. : M.S., Physical Chemistry, Sungkyunkwan University
• 1988. 3. - 1993. 2. : Ph. D., Surface and Materials Chemistry, Sungkyunkwan University
  • Thesis : Design and Construction of AES-LEED System and the Interation of Gases on Transition Metal Surfaces
• 1991. 11. - 1992. 10. : Commissioned Research Scientist, Solid State Chemistry Laboratory, Korea Institute of Science and Technology
• 1992. 11. - 1994. 5. : Research Scientist, Thin Film Materials Laboratory, Korea Research Institute of Chemical Technology, Daedeog Science Town
• 1994. 5. - 1995. 10. : Postdoctoral Fellow, Institute of Physical and Theoretical Chemistry, University of Bonn, Germany
• 1995. 12. - 1997. 1. : Visiting Scientist, Department of Physics, Cornell University, NY, U.S.A.
• 1997. 3. - present : Professor, Sungkyunkwan University, Korea
  
  

1. Materials chemistry : MOCVD and PVD of various advanced functional materials.
2. Surface chemistry : In-situ study on initial film growth mechanism by UHV-CVD systems.
3. Nano-chemistry : Nanoparticles, nanowires, nanocomposites, nanotubes.
4. Plasma chemistry & diagnostics : Plasma polymerization, plasma surface modification.
5. Plasma chemistry & diagnostics : PACVD of hard/super-hard and protective coatings.
   
   

Chemical vapor deposition (CVD) and physical vapor deposition (PVD) are used widely in materials processing technology. The majority of their applications involve applying solid thin-film coatings to surfaces, but they are also used to produce high-purity bulk materials and powders, as well as fabricating composite materials via infiltration techniques. CVD has been used to deposit a wide range of materials in many different area. Depending upon the applications, many variations of CVD processing area available. One of the variants includes metal-organic CVD (MOCVD). This is usually achieved by using metal-organic precursors, which decompose at relatively lower temperature. In our lab., we have deposited various advanced functional thin films such as TiO2, ZnO, ZrO2, GaN, SiC, and B2O3, etc. using MOCVD and PVD systems and studied on their properties and applications.

Surface physical chemistry is great important in the field of chemistry, applied solid physics, and materials science. The main part of our study is understanding of initial growth mechanism of thin films grown on various substrates by CVD method under UHV conditions. To obtain detail descriptions of single atoms and molecules which form the basis for understanding chemical and physical processes at surfaces, our lab. is making an ultra high vacuum system (UHV) connected with CVD chamber and UHV system equipped with RHEED system.

Nanostrutures - structures that are defined as having at least one dimension between 1 and 100 nm - have received steadily growing interests as a result of there peculiar and fascinating properties, and applications superior to there bulk counterparts. In our lab., we have deposited β-SiC Nanowires on nickel covered Si(100) substrates using a single molecular precursor at various deposition temperatures by metalorganic chemical vapor deposition (MOCVD) method and studied their surface and structural characteristics. Moreover, we are trying to get various functional nanostructures such as nanoparticles, nanocomposites, and NanoTubes using cold wall MOCVD, hot wall CVD, PVD, sol-gel solution deposition, and PECVD systems.

Recently, there have been extensive research activities on the use of plasma for the polymerization of number of organic compounds. Plasma polymers can be used in many applications including interlayer dielectric materials, coating for inhibiting corrosion, coating for optical applications, and low-friction surface coatings. Plasma polymerization is thus known as a unique method of organic thin film deposition. The organic thin films are usually highly cross-linked polymers and show chemically and physically stable characteristics. However, the molecular structures of the organic polymer films are different from starting monomers, because the plasma polymers are formed with highly decomposed molecules under ions and electron reactions with high energy. In our lab., we have grown plasma polymerized organic thin films on Si(100), glass, and metal substrates using different monomers such as toluene(C7H8), cyclohexane(C6H12), cyclohexen(C6H10), methylcyclohexane(C7H14), ethylcyclohexane(C8H16) as precursors by plasma enhanced chemical vapor deposition (PECVD) method.

Different types of processes are commonly used to deposit hard & super-hard coatings. In the case of TiON, SiNx, and TiON/SiNx coatings, the deposition techniques include physical vapor deposition (PVD) and chemical vapor deposition (CVD). In our lab., deposition of new advanced hard & super-hard coating materials both simple (TiON, SiNx, BON, etc) and multilayer (TiN/BON, SiC/BON, TiON/SiNx) thin films is now challenging by using PVD and PACVD methods with in-situ plasma diagnostics.

• Materials chemistry
  1. B.-C. Kang, H.-Y. Chae, J.-H. Lee, D.-Y. Jung, S.-B. Lee, and J.-H. Boo, "Selective Growth of TiO2 Thin Films on Si(100) Surfaces by Combination of MOCVD and Micro-contact Printing Methods", Journal of Vacuum Science and Technology B21(4), 1773 (2003).Full article PDF
  2. Byung-Chang Kang, Soon-Bo Lee and Jin-Hyo Boo, "Growth of TiO2 thin films on Si(100) substrates using single molecular precursors by metal organic chemical vapor deposition", Surface and Coatings Technology 131(1-3), 88 (2000). Full article PDF
  3. S. H. Jeong, J. W. Lee, S. B. Lee and J. H. Boo, "Deposition of aluminum-doped zinc oxide films by RF magnetron sputtering and study of their structural, electrical and optical properties", Thin Solid Films 435(1-2) 78 (2003). Full article PDF
     
     
• Surface chemistry
  1. H. G. Yoon, J.-H. Boo, W. L. Liu, S.-B. Lee, S.-C. Park, H. Kang, and Y. Kim, "In-situ study of the formation of SiC thin films on Si(111) surfaces with 1,3-disilabutane : Adsorption properties and initial deposition characteristics", Journal of Vacuum Science and Technology A18, 1464 (2000). Full article PDF
  2. C.-K. Jung, B.-C. Kang, H.-Y. Chae, Y.-S. Kim, M.-K. Seo, S.-K. Kim, S.-B. Lee, J.-H. Boo, Y.-J. Moon and J.-Y. Lee, "Growth of TiO2 thin films on Si(100) and Si(111) substrates using single molecular precursor by high-vacuum MOCVD and comparison of growth behavior and structural properties", Journal of Crystal Growth 235(1-4), 450 (2002). Full article PDF
     
     
• Nano-Chemistry
  1. Kyung Ho Jung, Jin-Hyo Boo and Byungyou Hong, "Synthesis of carbon nanotubes grown by hot filament plasma-enhanced chemical vapor deposition method", Diamond and Related Materials 13, 299 (2004). Full article PDF
     
     
• Plasma polymerization, plasma surface modification
  1. M.-C. Kim , S.-H. Cho , S.-B. Lee , Y. Kim and J.-H. Boo, "Characterization of polymer-like thin films deposited on silicon and glass substrates using PECVD method", Thin Solid Films 447-448, 592 (2004). Full article PDF
  2. Y. J. Yu, J. G. Kim, S. H. Cho and J. H. Boo, "Plasma-polymerized toluene films for corrosion inhibition in microelectronic devices", Surface and Coatings Technology 162(2-3), 161 (2003). Full article PDF
  3. M. C. Kim, S. H. Yang, J. -H. Boo and J. G. Han, "Surface treatment of metals using an atmospheric pressure plasma jet and their surface characteristics", Surface and Coatings Technology 174-175, 839 (2003). Full article PDF
     
     
• PACVD of hard/super-hard and protective coatings
  1. D.-C. Lim, G. C. Chen, S.-B. Lee and J.-H. Boo, "Structures and properties of !BON and multilayered TiN/BON thin films prepared by PAMOCVD method", Surface and Coatings Technology 163-164, 318 (2003). Full article PDF
  2. G. C. Chen, M. C. Kim, J. G. Han, S. -B. Lee and J. -H. Boo, "Synthesis and characterization of BON thin films using low frequency RF plasma enhanced MOCVD : effect of deposition parameters on film hardness", Surface and Coatings Technology 169-170, 281 (2003). Full article PDF
  3. J.-H. Boo, M. C. Kim, S.-B. Lee, S.-J. Park, and J.-G. Han, "Growth of SiC thin films on graphite for oxidation-protective coating", Journal of Vacuum Science and Technology A18, 1713 (2000). Full article PDF