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Brain Korea 21

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  1. In Materials Science Laboratory
  2. In CAPST

 1. In Materials Science Laboratory

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thermal High Vacuum MOCVD System
Cold Wall
Max. 2"
Mechanical pump / Turbo Molecular pump 

High Vacuum MOCVD System
Cold Wall
Max. 2"
Direct Sample Heating Method
Mechanical pump / Oil Diffusion pump 

Thermal MOCVD System
Quartz body
In-direct Sample Heating using Carbon-Block
Mechanical pump

Dual Sputtering System
13.56 MHz
Cold Wall
Max. 4" target
Mechanical pump / Turbo Molecular pump 

RF Magnetron Sputtering System
13.56 MHz
Cold Wall
1" & 4" Targets
Mechanical pump / Turbo Molecular pump

Thermal Evaporation System
Direct source heating method
Max. 3X3 cm
Mechanical pump

Furnace Chamber System
Quartz body
Max. 1000 ¡É
Mechanical pump

 2. In CAPST

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Plasma Polymerization System
13.56 MHz
Hot Wall (RT-800 ¡É)
Max. 50 cm

Surface Treatment System Using Microwave Plasma
13.56 MHz RT
DBD(Dielectric Barrier Discharge) plasma
Max. 20X20 cm with to-and-fro motion stage

Atmospheric Plasma Surface Treatment System
2.45 GHz Al chamber
Max. 30 cm with rotating stage

Hot Filament PECVD System for Nanotube Synthesis
DC Power supply
Cold Wall
Max. 4"

RF Magnetron Sputtering System
(Not Completed Yet)
Cold Wall
Max. 2"