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Lab Instruments
Low Energy Electron
Diffraction(LEED)

Figure : Si (111) 7X7 at 31eV
|
Principle |
Elastic monoenergetic electros are
diffracted from an ordered surface. The observed diffraction pattern can be used
to determine the periodicity of the two dimensional overlayer
lattice. |
|
Applications |
Determination of surface-crystallographic structures and two dimensional structures of adsorbed overlayer. |
Auger electron spectroscopy(AES)


Figure : Typical Auger electron spectra obtained during metal(Pt)-on-metal(Cu) epitaxy and
variation of Auger peak-to-peak intensities showing layer-by-layer growth mode.
|
Principle |
The Auger process occurs after an atomic level has been ionized by incident photons or electrons. The hole in the inner shell is filled by one electron from a higher level and a secondary electron (called Auger electron) escapes into the vacuum with the remaining kinetic energy. The kinetic energy of the secondary electron is measured to give information about surface composition. |
|
Applications |
The qaulitative and quantitative analysis of surface composition, Depth profiling to know elemental concentration in a direction normal to the surface. |
X-ray photoelectron spectroscopy
(XPS or ESCA)

Figure : The C 1s XP spectra from
stepwise desorption of
1,3-disilabutane adsorbed on Si(111) surface
|
Principle |
If monochromatic X-ray photons impinge on the sample surface, an electron which was bound to the solid with energy Eb is ejected into the vacuum with kinetic energy Ek. By conservation of energy, Ek = h¥í- Eb - ¥Õ Eb ; the binding energy can be deduced. Atomic and molecular species may be identified by comparision of Eb with standard values. |
|
Applications |
Determination of chemical state of elements on surface, Quantitative analysis of surface species, |
Ultraviolet photoelectron spectroscopy (UPS)

Figure : UP valence band spectra from the stepwise desorption
of 5.0L CO adsorbed W(110) surface at 200K
|
Principle |
If an low energy radiation source such as Helium discharge lamp (21.2 eV, 40.8 eV) is used instead of using X-rays for photoexcitation, the binding energy of an electron in valence band is measured to yield information about valence structures of surface. |
|
Applications |
Determination of valence band structures of surface, Structural information of adsorbed species, Determination of work function changes on surface. |
Cs+-ion scattering

Figure : The thermal decomposition reaction of DSB on a Si(111) surface
with Cs+-ion reactive scattering in the low temperature
|
Principle |
Cs+(g) + X-surface ¡æ Cs+(g) + X(g) + surface (reaction 1) Cs+(g) + X(g) ¡æ CsX+(g) (reaction 2) Collision of a low-energy Cs+ ion with a surface causes desorption of the adsorbate X from the surface (reaction 1). The desorbed X combines with the scattered Cs+ ion via electrostatic attraction forces in the gas phase, and forms a CsX+ ion complex (reaction 2). |
|
Applications |
The CsX+ ion product is detected by mass spectrometer. Note that this methodology probes neutral species (X) desorbed from a surface, which is an important advantage over secondary ion mass spectrometry |
Thermal desorption spectroscopy(TDS) and Temperatue programmed desorption spectroscopy(TPD)

Figure : The thermal desorption spectra of 3.0 L CO adsorbed at 950K
with exposures of O2 preadsorbed on W(110) at R.T
|
Principle |
An adsorbed layer on a sample surface is programmed upwards in temperature, and various desorption species are simultaneously monitored in multiplex mode. |
|
Applications |
Direct information on the adsorption and desorption energy, The kinetics of adsorption and desorption,Identification of desorption products. |