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Research Fields

The field of surface physical chemistry is currentry of great importance in a interdisciplinary areas, including chemistry, applied solid physics, and material science. An essential part of our research activities concerns a fundamental understanding of heterogeneous catalysis and thin film growth of semiconductor by chemical vapor deposition on the microscopic scale under ultra-high vacuum (UHV) conditions. This includes studies of the energetics of the chemisorption process as well as of adsorption and desorption kinetics of simple gases and simple surface reactions using various techniques such as low-energy electron diffraction(LEED), Auger electron spectroscopy(AES), X-ray photoelectron spectroscopy(XPS), Ultraviolet photoelectron spectroscopy(UPS), Cs⁺-ion scattering, and Thermal desorption spectroscopy(TDS).

Current main subjects;